The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 17, 2015

Filed:

Jun. 19, 2013
Applicant:

Avalanche Technology, Inc., Fremont, CA (US);

Inventors:

Yuchen Zhou, San Jose, CA (US);

Yiming Huai, Pleasanton, CA (US);

Jing Zhang, Los Altos, CA (US);

Rajiv Yadav Ranjan, San Jose, CA (US);

Roger Klas Malmhall, San Jose, CA (US);

Assignee:

Avalanche Technology, Inc., Fremont, CA (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/82 (2006.01); H01L 43/10 (2006.01); H01L 43/02 (2006.01);
U.S. Cl.
CPC ...
H01L 43/10 (2013.01); H01L 43/02 (2013.01);
Abstract

A perpendicular spin-transfer torque magnetic random access memory (STTMRAM) element is configured to store a state when electrical current is applied thereto. The perpendicular STTMRAM element includes a magnetization layer having a first free layer and a second free layer, separated by a non-magnetic separation layer (NMSL). The direction of magnetization of the first and second free layers each is in-plane prior to the application of electrical current and after the application of electrical current, the direction of magnetization of the second free layer becomes substantially titled out-of-plane and the direction of magnetization of the first free layer switches. Upon electrical current being discontinued, the direction of magnetization of the second free layer remains in a direction that is substantially opposite to that of the first free layer.


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