The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 10, 2015

Filed:

Dec. 27, 2012
Applicant:

Intermolecular, Inc., San Jose, CA (US);

Inventors:

Sergey Barabash, San Jose, CA (US);

Dipankar Pramanik, Saratoga, CA (US);

Xuena Zhang, San Jose, CA (US);

Assignee:

Intermolecular, Inc., San Jose, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/8242 (2006.01); H01L 21/20 (2006.01); H01L 29/40 (2006.01); H01L 29/66 (2006.01); B82Y 10/00 (2011.01); H01L 29/49 (2006.01); H01L 29/94 (2006.01);
U.S. Cl.
CPC ...
H01L 29/401 (2013.01); H01L 29/66181 (2013.01); H01L 29/94 (2013.01); B82Y 10/00 (2013.01); H01L 29/49 (2013.01);
Abstract

A doped fullerene-based conductive material can be used as an electrode, which can contact a dielectric such as a high k dielectric. By aligning the dielectric with the band gap of the doped fullerene-based electrode, e.g., the conduction band minimum of the dielectric falls into one of the band gaps of the doped fullerene-based material, thermionic leakage through the dielectric can be reduced, since the excited electrons or holes in the electrode would need higher thermal excitation energy to overcome the band gap before passing through the dielectric layer.


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