The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 10, 2015

Filed:

Nov. 30, 2011
Applicants:

Ulrich Tschinderle, Feistritz/Gail, AT;

Andreas Gleissner, Radenthein, AT;

Michael Brugger, Millstatt, AT;

Inventors:

Ulrich Tschinderle, Feistritz/Gail, AT;

Andreas Gleissner, Radenthein, AT;

Michael Brugger, Millstatt, AT;

Assignee:

Lam Research AG, Villach, AT;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/00 (2006.01); C23F 1/12 (2006.01); B05D 5/12 (2006.01); B08B 3/08 (2006.01); H01L 21/67 (2006.01);
U.S. Cl.
CPC ...
H01L 21/67051 (2013.01); H01L 21/6708 (2013.01); H01L 21/67126 (2013.01); H01L 21/6719 (2013.01);
Abstract

A method and device for processing wafer-shaped articles comprises a closed process chamber. A rotary chuck is located within the process chamber, and is adapted to hold a wafer shaped article thereon. An interior fluid distribution ring is positioned above the rotary chuck, and comprises an annular surface inclined downwardly from a radially inner edge to a radially outer edge thereof. At least one fluid distribution nozzle extends into the closed process chamber and is positioned so as to discharge fluid onto the annular surface of the fluid distribution ring.


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