The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 03, 2015
Filed:
Mar. 08, 2011
Everhardus Cornelis Mos, Best, NL;
Birgitt Noëlle Cornelia Liduine Hepp, Waalre, NL;
Jasper Thijs Menger, Eindhoven, NL;
Everhardus Cornelis Mos, Best, NL;
Birgitt Noëlle Cornelia Liduine Hepp, Waalre, NL;
Jasper Thijs Menger, Eindhoven, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A higher-level controller can correct measured metrology data with residual error values as reported by a lower-level controller. This results in a more accurate process disturbance estimate. A method of control obtains, based on measurement sample definition, a first process variable of a system under control, determines a residual error using the first process variable and a first set point, controls the system using the residual error, obtains, based on the same sample definition, a second process variable, and adjusts the second process variable using the residual error. The method may also include determining, using the adjusted second process variable, one or more first set points for controlling the system by the low-level controller that may vary in correspondence with the sample definition.