The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 03, 2015
Filed:
May. 03, 2013
Macronix International Co., Ltd., Hsin-Chu, TW;
Chen-Yuan Lin, Taitung, TW;
Ching-Lin Chan, Huwei Township, TW;
Cheng-Chi Lin, Toucheng Township, TW;
Shih-Chin Lien, Sinjhuang, TW;
Macronix International Co., Ltd., Hsin-Chu, TW;
Abstract
A pattern for use in the manufacture of semiconductor devices is provided which, according to an example embodiment, may comprise at least one second field region comprising a main array of dies, each having a height of Yand a width of X, and the main array having a height of Y. The pattern according to the example embodiment may further include at least one first field region comprising a monitoring region having a height of Yand a width of Xand an auxiliary die region having a height of Yand comprising an auxiliary array of dies. The dimensions of the various regions may be proportional to one another, such that X=n×X+adjustment, Y=n×Y+adjustment, and Y=n×Y+adjustment, n, n, and nbeing integers.