The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 03, 2015
Filed:
Apr. 10, 2012
Tsukasa Watanabe, Nirasaki, JP;
Keisuke Egashira, Nirasaki, JP;
Miyako Kaneko, Nirasaki, JP;
Takehiko Orii, Nirasaki, JP;
Tsukasa Watanabe, Nirasaki, JP;
Keisuke Egashira, Nirasaki, JP;
Miyako Kaneko, Nirasaki, JP;
Takehiko Orii, Nirasaki, JP;
Tokyo Electron Limited, Minato-Ku, JP;
Abstract
Disclosed is a technique for attaining high etching selectivity of a silicon nitride film to a silicon oxide film. The etching method includes a step of supplying a silylating agent to a substrate having a silicon nitride film and a silicon oxide film exposed on the surface thereof to thereby form a silylated film as a protective film over the surface of the silicon oxide film. After this step, an etching solution is supplied to the substrate. It is thus possible to selectively etch only the silicon nitride film.