The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 03, 2015
Filed:
Sep. 14, 2010
Masahide Iwasaki, Amagasaki, JP;
Toshihisa Nozawa, Amagasaki, JP;
Masahide Iwasaki, Amagasaki, JP;
Toshihisa Nozawa, Amagasaki, JP;
Tokyo Electron Limited, Tokyo, JP;
Abstract
A plasma processing apparatusincludes a processing chamber; a gas supply unitfor supplying a plasma processing gas into a processing chamber; a mounting tableconfigured to hold the target substrate W thereon; a plasma generating deviceconfigured to generate plasma within the processing chamber; and a gas supply device. The gas supply deviceincludes a head unitconfigured to move between a first position above the mounting tableand a second position different from the first position and to supply a gas, and the head unitis configured to supply a film forming gas to a small-volume region formed between the mounting tableand the head unitwhen the head unitis positioned at the first position and to adsorb the film forming gas on the target substrate W.