The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 24, 2015

Filed:

Jan. 08, 2014
Applicant:

Ebara Corporation, Tokyo, JP;

Inventors:

Akira Fukuda, Tokyo, JP;

Yoshihiro Mochizuki, Tokyo, JP;

Yutaka Wada, Tokyo, JP;

Yoichi Shiokawa, Tokyo, JP;

Hirokuni Hiyama, Tokyo, JP;

Assignee:

Ebara Corporation, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06F 19/00 (2011.01); G05B 11/01 (2006.01); G05B 19/18 (2006.01); B24B 49/00 (2012.01); B24B 1/00 (2006.01); G01D 1/00 (2006.01); G06F 17/50 (2006.01); B24B 53/017 (2012.01);
U.S. Cl.
CPC ...
B24B 53/017 (2013.01);
Abstract

A method dresses a polishing member with a diamond dresser having diamond particles arranged on a surface thereof. The method includes determining dressing conditions by performing a simulation of a distribution of a sliding distance of the diamond dresser on a surface of the polishing member, and dressing the polishing member with the diamond dresser under the determined dressing conditions. The simulation includes calculating the sliding distance corrected in accordance with a depth of the diamond particles thrusting into the polishing member.


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