The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 24, 2015
Filed:
Jun. 19, 2014
Applicant:
Kla-tencor Corporation, Milpitas, CA (US);
Inventors:
Layton Hale, Castro Valley, CA (US);
Francis Chilese, San Ramon, CA (US);
Qiang Q. Zhang, San Jose, CA (US);
Assignee:
KLA-Tencor Corporation, Milpitas, CA (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01J 35/20 (2006.01); H05G 2/00 (2006.01); G01N 21/95 (2006.01); G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
H05G 2/008 (2013.01); G01N 21/95 (2013.01); G01N 21/9501 (2013.01); G03F 7/70033 (2013.01);
Abstract
The generation of EUV light includes rotating a cylinder at least partially coated with a plasma-forming target material, directing pulsed illumination to a first set of helically-arranged spots traversing a material-coated portion of the rotating cylinder in a first direction and directing pulsed illumination to a second set of helically-arranged spots traversing the material-coated portion of the rotating cylinder in a second direction, the pulsed illumination being suitable for exciting the plasma-forming target material.