The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 24, 2015

Filed:

Jan. 30, 2014
Applicant:

Texas Instruments Incorporated, Dallas, TX (US);

Inventors:

Bhaskar Srinivasan, Plano, TX (US);

Brian E. Goodlin, Plano, TX (US);

Haowen Bu, Plano, TX (US);

Mark Visokay, Dallas, TX (US);

Assignee:
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/00 (2006.01); H01L 21/02 (2006.01); C23C 18/12 (2006.01); H01L 49/02 (2006.01);
U.S. Cl.
CPC ...
H01L 21/02112 (2013.01); C23C 18/1216 (2013.01); H01L 21/02197 (2013.01); H01L 28/56 (2013.01); H01L 21/022 (2013.01); H01L 21/02263 (2013.01);
Abstract

Multi-step deposition of lead-zirconium-titanate (PZT) ferroelectric material. An initial portion of the PZT material is deposited by metalorganic chemical vapor deposition (MOCVD) at a low deposition rate, for example at a temperature below about 640 deg C. from vaporized liquid precursors of lead, zirconium, and titanium, and a solvent at a collective flow rate below about 1.1 ml/min, in combination with an oxidizing gas. Following deposition of the PZT material at the low flow rate, the remainder of the PZT film is deposited at a high deposition rate, attained by changing one or more of precursor and solvent flow rate, oxygen concentration in the oxidizing gas, A/B ratio of the precursors, temperature, and the like.


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