The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 17, 2015

Filed:

Mar. 07, 2014
Applicants:

Kazuhiro Tomioka, Seoul, KR;

Satoshi Seto, Seoul, KR;

Masatoshi Yoshikawa, Seoul, KR;

Satoshi Inada, Yokohama, JP;

Inventors:

Kazuhiro Tomioka, Seoul, KR;

Satoshi Seto, Seoul, KR;

Masatoshi Yoshikawa, Seoul, KR;

Satoshi Inada, Yokohama, JP;

Assignee:

Other;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/00 (2006.01); H01L 43/12 (2006.01);
U.S. Cl.
CPC ...
H01L 43/12 (2013.01);
Abstract

According to one embodiment, a method of manufacturing a magnetoresistive element, the method includes forming a first non-magnetic layer on a first magnetic layer, forming a second magnetic layer on the first non-magnetic layer, forming a second non-magnetic layer on the second magnetic layer, forming a third magnetic layer on the second non-magnetic layer, patterning the third magnetic layer by a RIE using an etching gas including a noble gas and a nitrogen gas until a surface of the second non-magnetic layer is exposed, and patterning the second non-magnetic layer and the second magnetic layer after patterning of the third magnetic layer.


Find Patent Forward Citations

Loading…