The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 10, 2015

Filed:

Oct. 04, 2012
Applicant:

Taiwan Semiconductor Manufacturing Company, Ltd., Hsin-Chu, TW;

Inventors:

Ping-Chieh Wu, New Taipei, TW;

Tzu-Chin Lin, Hsinchu, TW;

Hung-Ting Lu, New Taipei, TW;

Wen-Chun Huang, Tainan, TW;

Ru-Gun Liu, Zhubei, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06F 17/50 (2006.01); G03F 7/00 (2006.01);
U.S. Cl.
CPC ...
G06F 17/50 (2013.01); G03F 7/00 (2013.01);
Abstract

The present disclosure describes a method of calibrating a contour. The method includes designing an anchor pattern, printing the anchor pattern on a substrate, collecting scanning electron microscope (SEM) data of the printed anchor pattern on the substrate, wherein the SEM data includes a SEM image of the printed anchor pattern on the substrate, converting the SEM image of the printed anchor pattern on the substrate into a SEM contour of the printed anchor pattern, analyzing the SEM contour of the printed anchor pattern, and aligning the SEM contour of the anchor pattern to form the calibrated SEM contour.


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