The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 10, 2015

Filed:

Feb. 22, 2013
Applicant:

Macronix International Co., Ltd., Hsinchu, TW;

Inventors:

Shih-Guei Yan, Hsinchu, TW;

Wen-Jer Tsai, Hsinchu, TW;

Ping-Hung Tsai, Hsinchu, TW;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/788 (2006.01); H01L 21/28 (2006.01);
U.S. Cl.
CPC ...
Abstract

Provided is a memory device including a first dielectric layer, a T-shaped gate, two charge storage layers and two second dielectric layers. The first dielectric layer is disposed on a substrate. The T-shaped gate is disposed on the first dielectric layer and has an upper gate and a lower gate, wherein two gaps are present respectively at both sides of the lower gate and between the upper gate and the substrate. The charge storage layers are respectively embedded into the gaps. A second dielectric layer is disposed between each charge storage layer and the upper gate, between each charge storage layer and the lower gate and between each charge storage layer and the substrate.


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