The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 03, 2015
Filed:
Jul. 26, 2012
Shigeru Kawamura, Nirasaki, JP;
Teruyuki Hayashi, Nirasaki, JP;
Shigeru Kawamura, Nirasaki, JP;
Teruyuki Hayashi, Nirasaki, JP;
Tokyo Electron Limited, Tokyo, JP;
Abstract
A substrate cleaning apparatus is capable of cleaning an entire periphery of a substrate end portion at a time by simple control without polishing the end portion and without generating plasma. The substrate cleaning apparatus has a mounting tableon which a wafer W is placed, a heating unitfor heating a wafer end portion, ultraviolet application unitfor applying ultraviolet to the wafer end portion, and a gas flow forming unitfor forming a gas flow on the surface of the wafer end portion. The heating unit, the ultraviolet application unit, and the gas flow forming unit are disposed near the wafer end portion so as to surround the wafer.