The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 03, 2015
Filed:
Nov. 30, 2012
Applicant:
Tokyo Electron Limited, Minato-ku, JP;
Inventors:
Assignee:
Tokyo Electron Limited, Minato-ku, JP;
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B08B 5/04 (2006.01); B08B 7/04 (2006.01); C23C 16/44 (2006.01); B08B 6/00 (2006.01); B08B 7/00 (2006.01);
U.S. Cl.
CPC ...
B08B 7/04 (2013.01); C23C 16/4401 (2013.01); C23C 16/4412 (2013.01); B08B 5/04 (2013.01); B08B 6/00 (2013.01); B08B 7/0035 (2013.01);
Abstract
A vacuum exhaust method of a substrate processing apparatus, after opening to the atmosphere, depressurizes a vacuum processing chamber having therein a mounting table for mounting a target substrate thereon. The vacuum exhaust method includes covering a surface of the mounting table with a protection member; sealing the vacuum processing chamber; vacuum evacuating the sealed vacuum processing chamber; and adsorbing at least one of foreign substances and out-gases by the protection member.