The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 13, 2015

Filed:

May. 16, 2012
Applicants:

Terutaka Nanri, Tokyo, JP;

Satoshi Tomimatsu, Tokyo, JP;

Inventors:

Terutaka Nanri, Tokyo, JP;

Satoshi Tomimatsu, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G21K 5/04 (2006.01); H01J 37/305 (2006.01); H01J 37/244 (2006.01); H01J 37/30 (2006.01); H01J 37/304 (2006.01);
U.S. Cl.
CPC ...
H01J 37/3056 (2013.01); H01J 37/244 (2013.01); H01J 37/30 (2013.01); H01J 37/304 (2013.01); H01J 2237/31713 (2013.01); H01J 2237/31745 (2013.01);
Abstract

Provided is a technique to perform FIB milling, in spite of its sample dependency, effectively into a desired shape without influences of individual differences among operators. A charged particle beam device includes an ion beam optical system device configured to irradiate a sample with an ion beam generated at an ion source; a controller thereof; an element detector configured to detect elements constituting the sample; a controller thereof; and a central processor configured to automatically set conditions for the sample based on the element specified by the element detector.


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