The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 13, 2015
Filed:
Nov. 30, 2011
James W. Thackeray, Braintree, MA (US);
Suzanne M. Coley, Mansfield, MA (US);
James F. Cameron, Brookline, MA (US);
Paul J. Labeaume, Framingham, MA (US);
Ahmad E. Madkour, Midland, MI (US);
Owendi Ongayi, Marlborough, MA (US);
Vipul Jain, Westborough, MA (US);
James W. Thackeray, Braintree, MA (US);
Suzanne M. Coley, Mansfield, MA (US);
James F. Cameron, Brookline, MA (US);
Paul J. LaBeaume, Framingham, MA (US);
Ahmad E. Madkour, Midland, MI (US);
Owendi Ongayi, Marlborough, MA (US);
Vipul Jain, Westborough, MA (US);
Dow Global Technologies LLC, Midland, MI (US);
Rohm and Haas Electronic Materials LLC, Marlborough, MA (US);
Abstract
A photoacid generator compound has formula (I):GZ  (I)wherein G has formula (II): In formula (II), X is S or I, each Ris commonly attached to X and is independently Calkyl; polycyclic or monocyclic Ccycloalkyl; polycyclic or monocyclic Caryl; or a combination comprising at least one of the foregoing groups. G has a molecular weight greater than 263.4 g/mol, or less than 263.4 g/mol. One or more Rgroups are further attached to an adjacent Rgroup, a is 2 or 3, wherein when X is I, a is 2, or when X is S, a is 2 or 3. Z in formula (I) comprises the anion of a sulfonic acid, a sulfonimide, or a sulfonamide. A photoresist and coated film also includes the photoacid generator, and a method of forming an electronic device uses the photoresist.