The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 06, 2015
Filed:
Jul. 22, 2011
Joern Weber, Aalen, DE;
Joern Weber, Aalen, DE;
Carl Zeiss SMT GmbH, Oberkochen, DE;
Abstract
A stress-reduced reflective optical element for a working wavelength in the soft X-ray and extreme ultraviolet wavelength range includes a first multilayer system () of at least two alternating materials () having different real parts of the refractive index at the working wavelength on a substrate (), which exerts a layer stress on the substrate (), and comprising a second multilayer system () of at least two alternating materials () on a substrate (), which exerts an opposed layer stress on the substrate () and is arranged between the first multilayer system () and the substrate (), wherein one of the materials () of the second multilayer system () is nickel-vanadium-silicon, and wherein the ratio (G) of the overall thickness of nickel-vanadium-silicon layers () within one period () of the second multilayer system () to the overall thickness of the period () of the second multilayer system () is at least 0.25.