The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 06, 2015
Filed:
Aug. 23, 2006
Tsutomu Tetsuka, Kasumigaura, JP;
Toshio Masuda, Hino, JP;
Naoshi Itabashi, Hachioji, JP;
Masanori Kadotani, Kudamatsu, JP;
Takashi Fujii, Kudamatsu, JP;
Tsutomu Tetsuka, Kasumigaura, JP;
Toshio Masuda, Hino, JP;
Naoshi Itabashi, Hachioji, JP;
Masanori Kadotani, Kudamatsu, JP;
Takashi Fujii, Kudamatsu, JP;
Hitachi High-Technologies Corporation, Tokyo, JP;
Abstract
The invention provides a plasma processing apparatus aimed at suppressing the corrosion caused by reactive gas and heavy-metal contamination caused by plasma damage of components constituting the high-frequency electrode and gas supply unit. The plasma processing apparatus comprises a processing chamberfor subjecting a processing substrateto plasma processing, gas supply meansandfor feeding gas to the processing chamber, and an antenna electrodefor supplying high-frequency radiation for discharging the gas to generate plasma, wherein the gas supply means includes a gas shower platehaving gas discharge holes on the surface exposed to plasma, and a portion of or a whole surface of the conductorexposed to gas constituting the antenna-electrode side of the gas supply means is subjected to ceramic spraying containing no heavy metal to form a protecting film