The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 06, 2015

Filed:

Sep. 06, 2011
Applicants:

Ying-hsueh Chang Chien, New Taipei, TW;

Shao-yen Ku, Jhubei, TW;

Ming-hsi Yeh, Hsinchun, TW;

Chi-ming Yang, Hsin-Chu, TW;

Chin-hsiang Lin, Hsin-Chu, TW;

Inventors:

Ying-Hsueh Chang Chien, New Taipei, TW;

Shao-Yen Ku, Jhubei, TW;

Ming-Hsi Yeh, Hsinchun, TW;

Chi-Ming Yang, Hsin-Chu, TW;

Chin-Hsiang Lin, Hsin-Chu, TW;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B08B 3/04 (2006.01); B08B 3/12 (2006.01);
U.S. Cl.
CPC ...
B08B 3/12 (2013.01);
Abstract

Methods and apparatus for a movable megasonic wafer probe. A method is disclosed including positioning a movable probe on a wafer surface, the movable probe having an open bottom portion that exposes a portion of the wafer surface; applying a liquid onto the wafer surface through a bottom portion of the movable probe; and moving the movable probe at a predetermined scan speed to traverse the wafer surface, applying the liquid to the wafer surface while moving over the wafer surface. In additional embodiments the method includes providing a transducer for applying megasonic energy to the wafer surface. Apparatus embodiments are disclosed including the movable megasonic wafer probe.


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