The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 06, 2015
Filed:
Feb. 27, 2013
Applicant:
Intermolecular Inc., San Jose, CA (US);
Inventors:
Indranil De, Mountain View, CA (US);
Anh Duong, Fremont, CA (US);
Assignee:
Intermolecular, Inc., San Jose, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C11D 7/50 (2006.01); G03F 7/32 (2006.01); C11D 7/32 (2006.01); G03F 7/42 (2006.01); C11D 11/00 (2006.01); H01L 21/02 (2006.01);
U.S. Cl.
CPC ...
G03F 7/327 (2013.01); C11D 7/3209 (2013.01); C11D 7/5009 (2013.01); C11D 7/5013 (2013.01); C11D 7/5022 (2013.01); G03F 7/425 (2013.01); C11D 11/0047 (2013.01); H01L 21/02052 (2013.01);
Abstract
A composition for removing photoresist and bottom anti-reflective coating from a semiconductor substrate is disclosed. The composition may comprise a nontoxic solvent, the nontoxic solvent having a flash point above 80 degrees Celsius and being capable of dissolving acrylic polymer and phenolic polymer. The composition may further comprise Tetramethylammonium Hydroxide (TMAH) mixed with the nontoxic solvent.