The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 30, 2014
Filed:
Jan. 19, 2012
Applicants:
Dexter Xueming Tan, Singapore, SG;
Yoke King Chin, Singapore, SG;
Kin Leong Pey, Singapore, SG;
Inventors:
Assignees:
GLOBALFOUNDRIES Singapore Pte. Ltd., Singapore, SG;
Nanyang Technological University, Singapore, SG;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 23/48 (2006.01); H01L 21/28 (2006.01); H01L 21/26 (2006.01);
U.S. Cl.
CPC ...
Abstract
A method for forming a device is disclosed. A substrate with a contact region is provided. Vacancy defects are formed in the substrate. The vacancy defects have a peak concentration at a depth D. A metal based contact is formed in the contact region. The metal based contact has a depth Dwhich is equal to about D. The vacancy defects lower the resistance of the metal based contact with the substrate.