The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 30, 2014
Filed:
Apr. 04, 2012
Applicants:
Yu-lung Yang, Taichung, TW;
Ying Xiao, Zhubei, TW;
Chin-hsiang Lin, Hsinchu, TW;
Inventors:
Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H05H 1/24 (2006.01); C23C 16/00 (2006.01); C23C 16/52 (2006.01);
U.S. Cl.
CPC ...
Abstract
A chuck and a wafer supported thereon are rotated during a plasma process or a film deposition process to reduce thickness non-uniformity of a film processed or deposited on the wafer.
Quick Actions:
Yang, Yu-Lung. (2014). Plasma process, film deposition method and system using rotary chuck (U.S. Patent No. 8920888). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/8920888
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile