The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 30, 2014
Filed:
Aug. 25, 2010
Naoki Mihara, Amagasaki, JP;
Naoki Matsumoto, Amagasaki, JP;
Jun Yoshikawa, Amagasaki, JP;
Kazuo Murakami, Amagasaki, JP;
Naoki Mihara, Amagasaki, JP;
Naoki Matsumoto, Amagasaki, JP;
Jun Yoshikawa, Amagasaki, JP;
Kazuo Murakami, Amagasaki, JP;
Tokyo Electron Limited, , JP;
Abstract
In a plasma processing apparatus for processing a substrate by plasmatizing a process gas introduced into a processing container, an introducing unit which introduces the process gas is formed on a ceiling surface of the processing container; a gas retention portion which gathers the process gas supplied from the outside of the processing container through a supply passage, and a plurality of gas ejection holes which allow communication between the gas retention portion and the inside of the processing container are formed in the introducing unit; a gas ejection hole is not formed in a location of the gas retention portion that faces an opening of the supply passage; and a cross section of each of the gas ejection holes has a flat shape.