The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 30, 2014

Filed:

Mar. 24, 2014
Applicant:

Dainippon Screen Mfg. Co., Ltd., Kyoto, JP;

Inventors:

Ichiro Mitsuyoshi, Kyoto, JP;

Jun Shibukawa, Kyoto, JP;

Shinji Kiyokawa, Kyoto, JP;

Tomohiro Kurebayashi, Kyoto, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B08B 3/04 (2006.01); H01L 21/677 (2006.01); H01L 21/67 (2006.01);
U.S. Cl.
CPC ...
B08B 3/04 (2013.01); H01L 21/67781 (2013.01); H01L 21/67754 (2013.01); H01L 21/67201 (2013.01); H01L 21/67742 (2013.01); H01L 21/67766 (2013.01);
Abstract

A substrate processing apparatus has an indexer block and a processing block. One side of the processing block has a vertical stack of a plurality of top surface cleaning units and the other side of the processing block has a vertical stack of a plurality of back surface cleaning units. Reversing units for reversing the substrate W are provided one above the other between the indexer block and the processing block. For example, one reversing unit is used for reversing the substrate before a back surface cleaning processing by the back surface cleaning unit or for other purposes, and the other reversing unit is used for placing the substrate W after a top surface cleaning processing by the top surface cleaning unit or for other purposes.


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