The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 23, 2014
Filed:
Aug. 05, 2013
Applicant:
D2s, Inc., San Jose, CA (US);
Inventors:
Akira Fujimura, Saratoga, CA (US);
Michael Tucker, Los Altos, CA (US);
Assignee:
D2S, Inc., San Jose, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 1/20 (2012.01); G03F 1/36 (2012.01); B82Y 10/00 (2011.01); G03F 7/20 (2006.01); G03F 1/78 (2012.01); G06F 17/50 (2006.01); H01J 37/302 (2006.01); G03F 1/70 (2012.01); H01J 37/317 (2006.01); B82Y 40/00 (2011.01);
U.S. Cl.
CPC ...
G03F 1/78 (2013.01); B82Y 10/00 (2013.01); G03F 7/2061 (2013.01); Y10S 430/143 (2013.01); G06F 17/5045 (2013.01); H01J 37/3026 (2013.01); G03F 1/70 (2013.01); H01J 37/3174 (2013.01); B82Y 40/00 (2013.01);
Abstract
In the field of semiconductor production using shaped charged particle beam lithography, a method and system for fracturing or mask data preparation or proximity effect correction is disclosed, wherein a plurality of circular or nearly-circular shaped beam shots can form a non-circular pattern on a surface. Methods for manufacturing a reticle and for manufacturing a substrate such as a silicon wafer by forming non-circular patterns on a surface using a plurality of circular or nearly-circular shaped beam shots is also disclosed.