The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 16, 2014
Filed:
Jul. 22, 2011
Tammo Uitterdijk, De Bilt, NL;
Erik Roelof Loopstra, Heeze, NL;
Laurens Anthony Sanderse, Eindhoven, NL;
Tammo Uitterdijk, De Bilt, NL;
Erik Roelof Loopstra, Heeze, NL;
Laurens Anthony Sanderse, Eindhoven, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
In an immersion lithographic apparatus, a final element is disclosed having, on a surface nearest the substrate, a layer bonded to the surface and having an edge barrier, of the same material as the layer, extending from the layer away from the substrate to shield the final element from a liquid. In an embodiment, the final element is attached to the apparatus via the layer and/or edge barrier, which may be made of a material with a coefficient of thermal expansion lower than the coefficient of thermal expansion of the final element.