The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 16, 2014
Filed:
Aug. 24, 2010
Eric Poortinga, Round Rock, TX (US);
Thomas Scherübl, Jena, DE;
Rigo Richter, Zeulenroda-Triebes, DE;
Arne Seyfarth, Jena, DE;
Eric Poortinga, Round Rock, TX (US);
Thomas Scherübl, Jena, DE;
Rigo Richter, Zeulenroda-Triebes, DE;
Arne Seyfarth, Jena, DE;
Carl Zeiss SMS GmbH, Jena, DE;
Abstract
In mask inspection, the defects that are of interest are primarily those that will also show up on wafer exposure. The aerial images generated in the resist and by emulation should be as identical as possible. This also applies to methods in which an overall structure that is divided into at least two substructures on at least two masks. A system and a method are provided for emulating a photolithographic process for generating on a wafer an overall structure that is divided into at least two substructures on at least two masks. The method includes generating aerial images of the at least two substructures, at least one of the aerial images being captured with a mask inspection microscope; correcting, by using a processing unit, errors in the at least one aerial image captured with a mask inspection microscope; and overlaying the aerial images of the at least two substructures to form an overall aerial image with the overall structure.