The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 16, 2014
Filed:
Feb. 27, 2006
Rajinder Dhindsa, San Jose, CA (US);
Mukund Srinivasan, Fremont, CA (US);
Kenji Takeshita, Sunnyvale, CA (US);
Alexei Marakhtanov, Albany, CA (US);
Andreas Fischer, Castro Valley, CA (US);
Rajinder Dhindsa, San Jose, CA (US);
Mukund Srinivasan, Fremont, CA (US);
Kenji Takeshita, Sunnyvale, CA (US);
Alexei Marakhtanov, Albany, CA (US);
Andreas Fischer, Castro Valley, CA (US);
Lam Research Corporation, Fremont, CA (US);
Abstract
Broadly speaking, the embodiments of the present invention provide an improved chamber cleaning mechanism. The present invention can also be used to provide additional knobs to tune the etch processes. In one embodiment, a plasma processing chamber configured to generate a plasma includes a bottom electrode assembly with an bottom electrode, wherein the bottom electrode is configured to receive a substrate. The plasma processing chamber includes a top electrode assembly with a top electrode and an inductive coil surrounding the top electrode. The inductive coil is configured to convert a gas into a plasma within a region defined within the chamber, wherein the region is outside an area defined above a top surface of the bottom electrode.