The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 09, 2014
Filed:
Nov. 06, 2012
Applicant:
Fei Company, Hillsboro, OR (US);
Inventors:
N. William Parker, Hillsboro, OR (US);
Mark W. Utlaut, Scappoose, OR (US);
David William Tuggle, Portland, OR (US);
Jeremy Graham, Portland, OR (US);
Assignee:
FEI Company, Hillsboro, OR (US);
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01J 3/14 (2006.01); H01J 37/09 (2006.01); G21K 1/00 (2006.01);
U.S. Cl.
CPC ...
G21K 1/00 (2013.01); H01J 2237/045 (2013.01); H01J 2237/0453 (2013.01); H01J 37/09 (2013.01);
Abstract
An improved beam-defining aperture structure and method for fabrication is realized. An aperture opening is made in a thin conductive film positioned over a cavity in a support substrate, where the aperture size and shape is determined by the opening in the conductive film and not determined by the substrate.