The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 09, 2014
Filed:
May. 24, 2012
Natsuki Tsuno, Tokyo, JP;
Hideyuki Kazumi, Tokyo, JP;
Yuzuru Mochizuki, Tokyo, JP;
Takafumi Miwa, Tokyo, JP;
Yoshinobu Kimura, Tokyo, JP;
Toshiyuki Yokosuka, Tokyo, JP;
Natsuki Tsuno, Tokyo, JP;
Hideyuki Kazumi, Tokyo, JP;
Yuzuru Mochizuki, Tokyo, JP;
Takafumi Miwa, Tokyo, JP;
Yoshinobu Kimura, Tokyo, JP;
Toshiyuki Yokosuka, Tokyo, JP;
Hitachi High-Technologies Corporation, Tokyo, JP;
Abstract
The present invention is characterized by an electron microscope which intermittently applies an electron beam to a sample and detects a secondary electron signal, wherein an arbitrarily defined detection time (T) shorter than the pulse width (Tp) of the applied electron beam is selected, and a secondary electron image is formed using the secondary electron signal acquired during the detection time. Consequently, it is possible to reflect necessary sample information including the internal structure and laminated interface of the sample in the contrast of an image and prevent unnecessary information from being superimposed on the image, thereby making it possible to obtain the secondary electron image with improved sample information selectivity and image quality.