The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 02, 2014
Filed:
Dec. 05, 2012
Applicant:
Kla-tencor Corporation, Milpitas, CA (US);
Inventors:
Jie-Fei Zheng, Fremont, CA (US);
Steve Cui, Fremont, CA (US);
Assignee:
KLA-Tencor Corporation, Milpitas, CA (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01B 9/02 (2006.01);
U.S. Cl.
CPC ...
G01B 9/02035 (2013.01);
Abstract
The disclosure is directed to focusing one or more detectors of an interferometry system. An initial focus position may be determined by focusing a detector on an edge of a sample by comparing image contrast of intensity frames collected by the detector. Data associated with an inner edge of a ring formed by the image of the sample reflected on a reference flat may be collected from one or more positions near the initial focus position. The detector can be focused to a selected position by comparing edge data collected at the various detector positions near the initial focus position.