The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 02, 2014
Filed:
May. 03, 2011
Martinus Hendrikus Antonius Leenders, Rhoon, NL;
Jozef Petrus Henricus Benschop, Veldhoven, NL;
Alexander Viktorovych Padiy, Geldrop, NL;
Tao Chen, Pearl River, NY (US);
Martinus Hendrikus Antonius Leenders, Rhoon, NL;
Jozef Petrus Henricus Benschop, Veldhoven, NL;
Alexander Viktorovych Padiy, Geldrop, NL;
Tao Chen, Pearl River, NY (US);
ASML Netherlands B.V., Veldhoven, NL;
ASML Holding N.V., Veldhoven, NL;
Abstract
In a solid immersion lithography apparatus, the final element of the projection system is maintained at a distance of less than about 50 nm from the substrate by an actuator system. The final element may be formed as two parts, with a fluid, e.g. a liquid, confined between them. The actuator system may be controlled relative to a reference frame, which may be supported by a bearing. Backscatter detection can be used to determine if the distance between the final element and the substrate is too large. A cleaning device can clean the substrate between exposures.