The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 02, 2014

Filed:

Aug. 02, 2011
Applicants:

Yoshifumi Ueno, Hiratsuka, JP;

Shinji Nagai, Hiratsuka, JP;

Osamu Wakabayashi, Hiratsuka, JP;

Inventors:

Yoshifumi Ueno, Hiratsuka, JP;

Shinji Nagai, Hiratsuka, JP;

Osamu Wakabayashi, Hiratsuka, JP;

Assignee:

Gigaphoton Inc., Tochigi, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H05G 2/00 (2006.01); G21K 5/00 (2006.01); G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
H05G 2/003 (2013.01); G03F 7/70033 (2013.01); G03F 7/70916 (2013.01); H05G 2/008 (2013.01);
Abstract

A chamber apparatus used with a laser apparatus may include: a chamber provided with at least one inlet through which a laser beam outputted from the laser apparatus enters the chamber; a target supply unit provided to the chamber for supplying a target material to a predetermined region inside the chamber; a magnetic field generation unit for generating a magnetic field in the predetermined region; and a charged particle collection unit disposed in a direction of a magnetic flux of the magnetic field for collecting a charged particle thereinto, the charged particle being generated when the target material is irradiated with the laser beam inside the chamber and traveling along the magnetic flux.


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