The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 02, 2014
Filed:
Feb. 22, 2012
Applicants:
Shuji Azumo, Nirasaki, JP;
Yasuhiko Kojima, Nirasaki, JP;
Inventors:
Shuji Azumo, Nirasaki, JP;
Yasuhiko Kojima, Nirasaki, JP;
Assignee:
Tokyo Electron Limited, Tokyo, JP;
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/768 (2006.01); C23C 16/16 (2006.01); C23C 16/448 (2006.01); H01L 23/532 (2006.01); H01L 21/285 (2006.01);
U.S. Cl.
CPC ...
H01L 21/28556 (2013.01); H01L 21/76846 (2013.01); C23C 16/16 (2013.01); C23C 16/4488 (2013.01); H01L 21/76873 (2013.01); H01L 23/53238 (2013.01); H01L 21/76843 (2013.01);
Abstract
In a film forming method for forming a Co film on a substrate provided in a processing chamber, gaseous Co(CO)as a single film forming material is supplied into the processing chamber. Then, the gaseous Co(CO)is thermally decomposed on the substrate to form the Co film on the substrate.