The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 02, 2014
Filed:
Dec. 29, 2011
James W. Thackeray, Braintree, MA (US);
Suzanne M. Coley, Mansfield, MA (US);
Vipul Jain, Westborough, MA (US);
Owendi Ongayi, Marlborough, MA (US);
James F. Cameron, Brookline, MA (US);
Paul J. Labeaume, Framingham, MA (US);
Ahmad E. Madkour, Midland, MI (US);
James W. Thackeray, Braintree, MA (US);
Suzanne M. Coley, Mansfield, MA (US);
Vipul Jain, Westborough, MA (US);
Owendi Ongayi, Marlborough, MA (US);
James F. Cameron, Brookline, MA (US);
Paul J. Labeaume, Framingham, MA (US);
Ahmad E. Madkour, Midland, MI (US);
Rohm and Haas Electronic Materials LLC, Marborough, MA (US);
Dow Global Technologies LLC, Midland, MI (US);
Abstract
A compound has formula (I):Q-O-(A)-ZG  (I)wherein Q is a halogenated or non-halogenated, Colefin-containing group, A is a fluorine-substituted Calkylene group, a fluorine-substituted Ccycloalkylene group, a fluorine-substituted Carylene group, or a fluorine-substituted Calkylene-arylene group, Z is an anionic group comprising sulfonate, sulfonamide, or sulfonimide, and Ghas formula (II): wherein X is S or I, each Ris halogenated or non-halogenated and is independently Calkyl group; a polycyclic or monocyclic Ccycloalkyl group; a polycyclic or monocyclic Caryl group; or a combination of these, wherein when X is S, one of the Rgroups is optionally attached to one adjacent Rgroup by a single bond, and a is 2 or 3, wherein when X is I, a is 2, or when X is S, a is 3. A copolymer, a photoresist, a coated substrate and method of patterning are disclosed.