The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 18, 2014

Filed:

Nov. 01, 2011
Applicants:

Chih-kai Kang, Tainan, TW;

Shu-hsuan Chih, Kaohsiung, TW;

Sheng-yuan Hsueh, Tainan, TW;

Chia-chen Sun, Kaohsiung, TW;

Po-kuang Hsieh, Kaohsiung, TW;

Chi-horn Pai, Tainan, TW;

Shih-chieh Hsu, New Taipei, TW;

Inventors:

Chih-Kai Kang, Tainan, TW;

Shu-Hsuan Chih, Kaohsiung, TW;

Sheng-Yuan Hsueh, Tainan, TW;

Chia-Chen Sun, Kaohsiung, TW;

Po-Kuang Hsieh, Kaohsiung, TW;

Chi-Horn Pai, Tainan, TW;

Shih-Chieh Hsu, New Taipei, TW;

Assignee:

United Microelectronics Corp., Science Based Industrial Park, Hsin-Chu, TW;

Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01R 27/08 (2006.01); H01L 23/48 (2006.01); H01L 21/66 (2006.01);
U.S. Cl.
CPC ...
H01L 22/34 (2013.01);
Abstract

A test key structure for use in measuring step height includes a substrate, and a pair of test contacts. The substrate includes an isolation region and a diffusion region. The test contact pair includes a first test contact and a second test contact for measuring electrical resistances. The first test contact is disposed on the diffusion region and the second test contact is disposed on the isolation region.


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