The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 11, 2014
Filed:
Jul. 31, 2012
Applicants:
Shinji Nagai, Hiratsuka, JP;
Junichi Fujimoto, Oyama, JP;
Kouji Ashikawa, Hiratsuka, JP;
Inventors:
Assignee:
Gigaphoton Inc., Tochigi, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G02B 5/08 (2006.01); G21K 5/00 (2006.01); H05G 2/00 (2006.01);
U.S. Cl.
CPC ...
H05G 2/008 (2013.01); H05G 2/005 (2013.01); G21K 5/00 (2013.01); G02B 5/0891 (2013.01);
Abstract
A chamber apparatus, which may be used with an external apparatus having an obscuration region, may include: a chamber in which EUV light is generated; a collector mirror having a first through-hole formed in a region aside from the center thereof and configured to collect the EUV light generated inside the chamber, the collector mirror being positioned such that the first through-hole is located in a region substantially corresponding to the obscuration region; and an etching gas supply unit provided in the first through-hole and configured to supply an etching gas into the chamber.