The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 11, 2014

Filed:

Apr. 08, 2009
Applicants:

Wei Fang, Milpitas, CA (US);

Jack Jau, Los Altos Hills, CA (US);

Yan Zhao, San Jose, CA (US);

Inventors:

Wei Fang, Milpitas, CA (US);

Jack Jau, Los Altos Hills, CA (US);

Yan Zhao, San Jose, CA (US);

Assignee:
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/28 (2006.01); H01J 37/30 (2006.01); H01J 37/02 (2006.01);
U.S. Cl.
CPC ...
H01J 37/28 (2013.01); H01J 2237/004 (2013.01); H01J 37/026 (2013.01); H01J 2237/0044 (2013.01); H01J 2237/0048 (2013.01);
Abstract

A method for enhancing the quality of a charged particle microscopic image of a sample is disclosed. The image is formed by a charged particle beam imaging system. The method comprising: scanning, using a first scanning beam, a surface of the sample in at least one first scan line; and scanning, using a second scanning beam, the sample surface in at least one second scan line, wherein said second scanning beam is scanned across said sample surface during a time interval between the end of said first scan lines and the beginning of the next said first scan lines. Application of the proposed method as a charged particle beam imaging system is also disclosed.


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Fang, Wei. (2014). Charged particle beam imaging assembly and imaging method thereof (U.S. Patent No. 8884224). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/8884224

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