The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 11, 2014
Filed:
Jan. 07, 2010
Hyungsuk Alexander Yoon, San Jose, CA (US);
William Thie, Mountain View, CA (US);
Yezdi Dordi, Palo Alto, CA (US);
Andrew D. Bailey, Iii, Pleasanton, CA (US);
Hyungsuk Alexander Yoon, San Jose, CA (US);
William Thie, Mountain View, CA (US);
Yezdi Dordi, Palo Alto, CA (US);
Andrew D. Bailey, III, Pleasanton, CA (US);
Lam Research Corporation, Fremont, CA (US);
Abstract
A method for generating plasma for removing metal oxide from a substrate is provided. The method includes providing a powered electrode assembly, which includes a powered electrode, a dielectric layer, and a wire mesh disposed between the powered electrode and the dielectric layer. The method also includes providing a grounded electrode assembly disposed opposite the powered electrode assembly to form a cavity wherein the plasma is generated. The wire mesh is shielded from the plasma by the dielectric layer when the plasma is present in the cavity, which has an outlet at one end for providing the plasma to remove the metal oxide. The method further includes introducing at least one inert gas and at least one process gas into the cavity. The method yet also includes applying an rf field to the cavity using the powered electrode to generate the plasma from the inert and the process gas.