The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 04, 2014
Filed:
Dec. 01, 2010
Toshie Yaguchi, Omitama, JP;
Yasuhira Nagakubo, Hitachinaka, JP;
Akira Watabe, Higashiibaraki, JP;
Hitachi High-Technologies Corporation, Tokyo, JP;
Abstract
The electron beam apparatus sample holding means has a diaphragm which is placed on upper and lower sides of a sample to form a cell for separating a gas atmosphere and a vacuum atmosphere of a sample chamber and sealing an ambient atmosphere of the sample; a gas supply means for supplying gas to an inside of the cell; and exhaust means for exhausting gas. The exhaust means includes a gas exhaust pipe provided in the inside of the cell and an openable/closable exhaust hole provided in a sidewall of the sample holding means so as to pass through the cell. The diaphragm is an amorphous film made of light elements which can transmit an electron beam, such as carbon films, oxide films, and nitride films.