The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 04, 2014
Filed:
Oct. 20, 2011
Yuta Kanno, Toyama, JP;
Makoto Nakajima, Toyama, JP;
Tomoko Misaki, Funabashi, JP;
Motonobu Matsuyama, Funabashi, JP;
Masayuki Haraguchi, Funabashi, JP;
Yuta Kanno, Toyama, JP;
Makoto Nakajima, Toyama, JP;
Tomoko Misaki, Funabashi, JP;
Motonobu Matsuyama, Funabashi, JP;
Masayuki Haraguchi, Funabashi, JP;
Nissan Chemical Industries, Ltd., Tokyo, JP;
Abstract
A resist underlayer film forming composition for lithography includes: as a component (I), a fluorine-containing highly branched polymer obtained by polymerizing a monomer A having two or more radical polymerizable double bonds in the molecule thereof, a monomer B having a fluoroalkyl group and at least one radical polymerizable double bond in the molecule thereof, and a monomer D having a silicon atom-containing organic group and at least one radical polymerizable double bond in the molecule thereof, in the presence of a polymerization initiator C in a content of 5% by mole or more and 200% by mole or less, based on the total mole of the monomer A, the monomer B, and the monomer D; and as a component (II), a hydrolyzable silane compound, a hydrolysis product thereof, a hydrolysis-condensation product thereof, or a silicon-containing compound that is a combination of these compounds.