The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 04, 2014
Filed:
Oct. 23, 2009
Gerard M. Schmid, Austin, TX (US);
Douglas J. Resnick, Leander, TX (US);
Sidlgata V. Sreenivasan, Austin, TX (US);
Frank Y. Xu, Round Rock, TX (US);
Gerard M. Schmid, Austin, TX (US);
Douglas J. Resnick, Leander, TX (US);
Sidlgata V. Sreenivasan, Austin, TX (US);
Frank Y. Xu, Round Rock, TX (US);
Canon Nanotechnologies, Inc., Austin, TX (US);
Abstract
Systems, methods, and processes for forming imprint lithography templates from a multi-layer substrate are described. The multi-layer substrate may include a block copolymer layer positioned on a substrate layer. The block copolymer layer may include two or more domains. At least one domain may have a different composition sensitivity than another domain such that the domains have different reactions to a specific process. Reaction of the domains to the specific process may provide a pattern in the block copolymer layer. The pattern may be transferred into the substrate layer to form the imprint lithography template.