The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 28, 2014

Filed:

May. 17, 2012
Applicants:

Shinji Nagai, Hiratsuka, JP;

Tamotsu Abe, Hiratsuka, JP;

Hitoshi Nagano, Hiratsuka, JP;

Osamu Wakabayashi, Hiratsuka, JP;

Inventors:

Shinji Nagai, Hiratsuka, JP;

Tamotsu Abe, Hiratsuka, JP;

Hitoshi Nagano, Hiratsuka, JP;

Osamu Wakabayashi, Hiratsuka, JP;

Assignee:

Gigaphoton Inc., Tochigi, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G21K 5/00 (2006.01); G21K 5/02 (2006.01); H05G 2/00 (2006.01); G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
H05G 2/005 (2013.01); G21K 5/02 (2013.01); G21K 5/00 (2013.01); G03F 7/70025 (2013.01);
Abstract

An apparatus for generating extreme ultraviolet light used with a laser apparatus and connected to an external device so as to supply the extreme ultraviolet light thereto includes a chamber provided with at least one inlet through which a laser beam is introduced into the chamber; a target supply unit provided on the chamber configured to supply a target material to a predetermined region inside the chamber; a discharge pump connected to the chamber; at least one optical element provided inside the chamber; an etching gas introduction unit provided on the chamber through which an etching gas passes; and at least one temperature control mechanism for controlling a temperature of the at least one optical element.


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