The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 28, 2014

Filed:

Apr. 18, 2012
Applicants:

Chin-ming Lin, Jhunan Township, Miaoli County, TW;

Wan-lai Chen, Hsinchu, TW;

Chia-hung Huang, Hsinchu, TW;

Chi-ming Yang, Hsinchu, TW;

Chin-hsiang Lin, Hsin-Chu, TW;

Inventors:

Chin-Ming Lin, Jhunan Township, Miaoli County, TW;

Wan-Lai Chen, Hsinchu, TW;

Chia-Hung Huang, Hsinchu, TW;

Chi-Ming Yang, Hsinchu, TW;

Chin-Hsiang Lin, Hsin-Chu, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/76 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method of orienting a semiconductor wafer. The method includes rotating a wafer about a central axis; exposing a plurality of edge portions of the rotating wafer to light having a predetermined wavelength from one or more light sources; detecting a subsurface mark in one of the plurality of edge portions of the rotating wafer; and orienting the wafer using the detected subsurface mark as a reference.


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