The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 28, 2014
Filed:
Nov. 02, 2012
Applicant:
Carl Zeiss Smt Gmbh, Oberkochen, DE;
Inventors:
Assignee:
Carl Zeiss SMT GmbH, Oberkochen, DE;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 5/08 (2006.01); C03B 19/09 (2006.01); C03B 19/06 (2006.01); C03C 10/00 (2006.01); G03F 7/20 (2006.01); C03C 14/00 (2006.01); C03C 3/06 (2006.01);
U.S. Cl.
CPC ...
G02B 5/08 (2013.01); C03C 2201/42 (2013.01); C03B 19/09 (2013.01); C03B 19/06 (2013.01); C03C 10/00 (2013.01); G03F 7/70891 (2013.01); C03C 14/00 (2013.01); C03C 3/06 (2013.01);
Abstract
For the production of mirrors for EUV lithography, substrates are suggested having a mean relative thermal longitudinal expansion of no more than 10 ppb across a temperature difference ΔT of 15° C. and a zero-crossing temperature in the range between 20° C. and 40° C. For this purpose, at least one first and one second material having low thermal expansion coefficients and opposite gradients of the relative thermal expansion as a function of temperature are selected and a substrate is produced by mixing and bonding these materials.