The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 21, 2014

Filed:

Sep. 06, 2011
Applicants:

Rolf Schipper, Karlsruhe, DE;

Joachim Lange, Hagenbach, DE;

Inventors:

Rolf Schipper, Karlsruhe, DE;

Joachim Lange, Hagenbach, DE;

Assignee:

Bruker AXS GmbH, Karlsruhe, DE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 23/20 (2006.01);
U.S. Cl.
CPC ...
G01N 23/20091 (2013.01); G01N 2223/33 (2013.01); G01N 2223/1016 (2013.01); H01J 2235/081 (2013.01);
Abstract

A method for performing an X-ray diffractometry analysis of a crystalline and/or amorphous sample, by means of an optical X-ray apparatus having an X-ray source with an X-ray anode constructed from a mixed configuration of at least two metals is characterized in that an energy-dispersive semi-conductor is used for acquiring detector events from the X-rays emanating from the sample, and that X-rays diffracted or scattered by the sample with different characteristic energy lines belonging to the metals of the mixed configuration of the X-ray anode used, are acquired simultaneously during an angle scan. With this method, X-ray diffractometry analysis with multiple characteristic energy lines are possible without any need for conversion or switchover.


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