The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 21, 2014

Filed:

Nov. 12, 2009
Applicants:

Hau-tai Shieh, Hsin-Chu, TW;

Chen-hui Hsieh, Feng-Shan, TW;

Inventors:

Hau-Tai Shieh, Hsin-Chu, TW;

Chen-Hui Hsieh, Feng-Shan, TW;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/02 (2006.01); H01L 23/522 (2006.01); H01L 23/00 (2006.01); H01L 49/02 (2006.01); H01L 27/02 (2006.01);
U.S. Cl.
CPC ...
H01L 24/06 (2013.01); H01L 2924/01023 (2013.01); H01L 2924/01042 (2013.01); H01L 2924/01005 (2013.01); H01L 2224/05093 (2013.01); H01L 2924/01072 (2013.01); H01L 2924/01029 (2013.01); H01L 2924/01075 (2013.01); H01L 2924/01019 (2013.01); H01L 2224/05624 (2013.01); H01L 2924/01327 (2013.01); H01L 2924/14 (2013.01); H01L 2924/01044 (2013.01); H01L 2924/01022 (2013.01); H01L 2924/01014 (2013.01); H01L 2224/05647 (2013.01); H01L 2924/01078 (2013.01); H01L 2924/01028 (2013.01); H01L 23/5223 (2013.01); H01L 2924/04953 (2013.01); H01L 24/05 (2013.01); H01L 2924/01033 (2013.01); H01L 2924/01057 (2013.01); H01L 28/40 (2013.01); H01L 2224/05681 (2013.01); H01L 2224/05666 (2013.01); H01L 2924/01027 (2013.01); H01L 2924/01013 (2013.01); H01L 27/0207 (2013.01); H01L 2924/0104 (2013.01); H01L 2924/01073 (2013.01); H01L 2924/04941 (2013.01); H01L 2924/30105 (2013.01); H01L 2924/19041 (2013.01); H01L 2924/05042 (2013.01); H01L 2924/0105 (2013.01); H01L 2924/01007 (2013.01); H01L 2924/01074 (2013.01); H01L 2924/01025 (2013.01);
Abstract

An integrated circuit structure includes one or more external contact pads with decoupling capacitors, such as metal-insulator-metal (MIM) capacitors, formed directly thereunder. In an embodiment, the decoupling capacitors are formed below the first metallization layer, and in another embodiment, the decoupling capacitors are formed in the uppermost inter-metal dielectric layer. A bottom plate of the decoupling capacitors is electrically coupled to one of Vand V, and the top plate of the decoupling capacitors is electrically coupled to the other. The decoupling capacitors may include an array of decoupling capacitors formed under the external contact pads and may include one or more dummy decoupling capacitors. The one or more dummy decoupling capacitors are MIM capacitors in which at least one of the top plate and the bottom plate is not electrically coupled to an external contact pad.


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