The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 14, 2014
Filed:
Mar. 15, 2013
Cadence Design System, Inc., San Jose, CA (US);
Vassilios Gerousis, San Jose, CA (US);
Shuo Zhang, Fremont, CA (US);
Stefanus Mantik, San Jose, CA (US);
Yuan Huang, Redwood City, CA (US);
Jing Chen, Fremont, CA (US);
Jianmin Li, Los Gatos, CA (US);
Cadence Design Systems, Inc., San Jose, CA (US);
Abstract
Disclosed are methods, systems, and articles of manufactures for implementing multiple-patterning-aware correct-by-construction layout processing for an electronic design by identifying rules for a first layer and for second layer(s) adjacent to the first layer, determining one or more sets of grids based on the rules, extending or implementing shapes to terminate at some grids of the one or more sets of grids, and populating the data of the ends of the shapes in the first layer in a data structure. The one or more sets of grids are in direction(s) perpendicular to the routing direction(s) of the first layer and have one or more grid pitches determined based at least in part upon routing pitch(es) of the second layer(s) and rule(s) for vias.