The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 30, 2014
Filed:
Mar. 26, 2010
Naohiro Tango, Shizuoka, JP;
Michihiro Shirakawa, Shizuoka, JP;
Mitsuhiro Fujita, Kanagawa, JP;
Shuhei Yamaguchi, Shizuoka, JP;
Akinori Shibuya, Shizuoka, JP;
Shohei Kataoka, Shizuoka, JP;
Naohiro Tango, Shizuoka, JP;
Michihiro Shirakawa, Shizuoka, JP;
Mitsuhiro Fujita, Kanagawa, JP;
Shuhei Yamaguchi, Shizuoka, JP;
Akinori Shibuya, Shizuoka, JP;
Shohei Kataoka, Shizuoka, JP;
FUJIFILM Corporation, Tokyo, JP;
Abstract
An actinic ray-sensitive or radiation-sensitive resin composition includes: (A) a resin capable of increasing a solubility of the resin (A) in an alkali developer by an action of an acid; and (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation, wherein (B) the compound capable of generating an acid upon irradiation with an actinic ray or radiation is contained in an amount of 10 to 30 mass % based on the entire solid content of the actinic ray-sensitive or radiation-sensitive resin composition, and a pattern forming method uses the composition.